Process labels, shop-floor steps, and the plant metrics that get treated as one number.
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- Why spacer-defined pitch is not drawn CD Drawn CD is the linewidth on the reticle.
- What a coater/developer track actually does The track is the lithography cluster's wet and thermal line.
- Why throughput is not cycle time Throughput is wafers per hour.
Latest
- Mix-ups Why throughput is not cycle time
- Mix-ups Why wafer starts are not wafer outs
- Fab floor What a coater/developer track actually does
- Fab floor What CMP is actually doing on the line
- Process Why spacer-defined pitch is not drawn CD
- Process Why overlay is not CD
- Mix-ups Why yield is not the same as utilization
- Fab floor What actually happens at a wafer probe
- Process Why a nanometer node is not a transistor size